材料科学
复合数
聚合物
正硅酸乙酯
化学工程
防反射涂料
聚苯乙烯
逐层
纳米结构
薄膜
纳米技术
涂层
复合材料
工程类
作者
Ting-Xuan Lin,Feng-Ming Hsu,Yun-Lun Lee,Raita Goseki,Takashi Ishizone,Jeng‐Shiung Jan
标识
DOI:10.1021/acsami.6b07874
摘要
Antireflective (AR) silica/polymer composite coatings on glass and poly(methyl methacrylate) (PMMA) substrates were prepared by silica mineralization of layer-by-layer (LbL) assembled films composed of polystyrene-block-poly(l-lysine)/poly(l-glutamic acid) (PS-b-PLL/PGA) complex vesicles without any post-treatments. PS-b-PLL AB and A2B block copolymers with appropriate block ratio can self-assemble to form vesicles, which can be deposited onto substrates without dissociation. Silica deposition specifically onto the complex vesicles in the multilayer films through amine-catalyzed polycondensation results in the continuous, intact composite coatings comprising vesicular nanostructures, which provided an additional parameter for tuning their optical properties. The film thickness and porosity are mainly dictated by the bilayer number and the degree of deformation/fission of vesicles upon complexation and mineralization, depending on polymer composition. The coated PMMA substrate with maximum transmission over 98% can be achieved at the optimized wavelength region. The AR composite films were mechanically stable to withstand both the wipe and adhesion tests due to the preparation of continuous, intact films. This study demonstrated that the concept of preparing composite films comprising vesicular nanostructures through the combination of LbL assembly and biomineralization is feasible.
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