煅烧
石墨氮化碳
光催化
材料科学
聚合
光降解
化学工程
催化作用
无机化学
有机化学
化学
复合材料
工程类
聚合物
作者
Thi Kim Anh Nguyen,Thanh-Truc Pham,Bolormaa Gendensuren,Eun‐Suok Oh,Eun Woo Shin
标识
DOI:10.1016/j.jmst.2021.07.013
摘要
In this study, water-dispersible graphitic carbon nitride (g-C3N4) photocatalysts were successively prepared through the chemically oxidative etching of bulk g-C3N4 that was polymerized thermally in different calcination atmospheres such as air, CO2, and N2. The different calcination atmospheres directly influenced the physicochemical and optical properties of both bulk and water-dispersible g-C3N4, changing the photocatalytic degradation behavior of methylene blue (MB) and tetracycline hydrochloride (TC-HCl) for water-dispersible g-C3N4. The bubble-burst process in the thermal polymerization of thiourea produced defective edges containing C=O groups that preferred substituting the C-NHx groups over bulk g-C3N4. In the oxygen-free N2 atmosphere among the different calcination atmospheres, more C=O functional groups were generated on the defective edges of bulk g-C3N4, resulting in the highest N vacancy of the tri-s-triazine structure. During the successive chemical oxidation, S- or O-containing functional groups were introduced onto water-dispersible g-C3N4. The water-dispersible g-C3N4 photocatalyst from the oxygen-free N2 atmosphere (NTw) contained the most O- and S- functional groups on the g-C3N4 surface. Consequently, NTw exhibited the highest photocatalytic activity in the MB and TC-HCl photodegradation because of its slowest recombination process, which was ascribed to the unique surface properties of NTw such as abundant functional groups on the defective edges and N-deficient property.
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