NiFe Alloy Protected Silicon Photoanode for Efficient Water Splitting

Electrodeposition of a thin layer of NiFe alloy atop np+-Si with its native oxide affords an efficient and stable photoanode for photoelectrochemical water oxidation. This photoanode exhibits a low onset potential of 0.89 V versus RHE (Reversible Hydrogen Electrode) for water oxidation and a high solar-to-O2 conversion efficiency of 3.3% in 1 m KOH under 1 sun illumination and outperforms those of reported silicon photoanodes. As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.