德拉姆
频道(广播)
晶体管
材料科学
光电子学
非易失性存储器
电子工程
电气工程
计算机科学
计算机网络
工程类
电压
作者
Yongjin Lee,Daewon Ha,W. Lee,Seung‐Hwan Yoo,J.H. Bae,M.H. Cho,Kicheon Yoo,Sangmoon Lee,Sangmin Lee,Masayuki Terai,Tsung-Han Lee,Kyoung-Jun Moon,Chang Kyung Sung,M. Hong,D. G. Cho,Hyungtak Kim,Jae Hwa Seo,K. Park,Bong Jin Kuh,Seok-Hun Hyun
标识
DOI:10.1109/snw63608.2024.10639202
摘要
In DRAM technology at nodes below 10 nm, scaling down conventional architectures presents significant challenges due to uprising physical limit on integration and electrical properties. As alternatives, innovative structures incorporating deposition channels, such as VCT with IGZO channels, are being explored. This paper presents the IGZO channel VCT as a promising candidate for next-generation DRAM cell architecture with several technical challenges.
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