显微镜
透射电子显微镜
材料科学
常规透射电子显微镜
量子隧道
电子显微镜
扫描隧道显微镜
隧道枢纽
光电子学
光学
纳米技术
扫描透射电子显微镜
物理
作者
M. I. Lutwyche,Yasuo Wada
摘要
This letter reports the observation of the vacuum tunnel gap between two conductors using a high resolution transmission electron microscope. A 2.5 mm square micromachined tunneling microscope chip has been fabricated with a minimum feature size of 0.4 μm. The chip fits into a modified side-entry type transmission electron microscope holder. The tunnel gap is controlled by a purpose-built feedback controller. The micromachines work reliably during observation of the tip apex in a transmission electron microscope, allowing the voltage and current to be changed while the tunnel gap is observed.
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