光催化
材料科学
密度泛函理论
氮化碳
分子内力
空位缺陷
分子
碳纤维
离域电子
光化学
三嗪
电子结构
氮化物
化学工程
共轭体系
纳米技术
化学物理
还原(数学)
分子工程
载流子
嫁接
沸石咪唑盐骨架
电荷(物理)
电子
作者
Qunhua Zhong,Qin Li,Ran Yang,Zhanzhen Ma,Sirui Liu,Yingxue Cui,Huachen Lin,Di Li
出处
期刊:Chemsuschem
[Wiley]
日期:2026-05-31
卷期号:19 (11): e70777-e70777
被引量:2
摘要
Carbon nitride (CN) has attracted extensive attention in the field of photocatalytic CO 2 reduction owing to its controllable structure and low preparation cost. However, it suffers from severe recombination of photogenerated carriers and strong localization of the π‐conjugated system, leading to unsatisfactory photocatalytic performance. Although defect engineering can enhance charge separation by breaking the periodic structure of CN, the π‐electron delocalization remains confined. Meanwhile, constructing donor–acceptor (D–A) structures with conjugated π‐systems can extend electron delocalization and promote charge transfer. Herein, by introducing carbon vacancies and grafting sulfone‐containing electron‐withdrawing molecules, we prepare photocatalysts with intramolecular D–A structure (V C –DSDA), where the sulfone unit bridges electron‐rich triazine rings to facilitate directional charge transfer. Density functional theory (DFT) calculations show that the synergistic effect of vacancy engineering with the D–A structure breaks the periodic structure of CN and extends the π‐electron off‐domain range, which significantly improves the separation efficiency of the photogenerated charges. As a result, the optimized 5% V C –DSDA achieves a remarkable CO generation rate of 35.57 μmol g −1 h −1 , which was 6.4 and 2.6 times higher than that of pristine and vacancy‐modified CN. This article demonstrates a dual‐regulation strategy for designing high‐performance CN photocatalysts through defect engineering and molecular grafting.
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