可变增益放大器
视频阵列图形
CMOS芯片
电容器
带宽(计算)
电气工程
噪声系数
寄生电容
放大器
电容
材料科学
电子工程
物理
光电子学
工程类
电压
电信
运算放大器
电极
量子力学
作者
Tianjun Wu,Chenxi Zhao,Huihua Liu,Yunqiu Wu,Yiming Yu,Kai Kang
标识
DOI:10.1109/rfic.2019.8701807
摘要
This paper presents a broadband variable gain amplifier (VGA) with low phase variation in 65 nm CMOS technology. The mechanism of phase variation in CMOS VGA is analyzed. According to the analysis, the feedforward paths formed by parasitic capacitive and inductive couplings are one of the main factors that result in phase variation in CMOS VGA. In order to achieve low phase variation, a parasitic capacitor elimination technique is proposed to remove the feedforward path formed by gate-drain parasitic capacitor. Besides, an isolation enhancement layout technique is proposed to minimize the inductive coupling and parasitic capacitors in the layout of the variable gain stage. As results, the measured phase variation is 0.2° ~ 2° in 18 GHz ~ 37 GHz and 0.2° ~ 5.4° in 18 GHz ~ 45 GHz when the gain variation range is 21.5 dB. The measured peak gain is 14.5 dB with 3-dB bandwidth of 20 GHz ~ 43 GHz. The gain ripple in 3-dB bandwidth is <; 2.5 dB. The noise figure and input-referred P1dB are 5.5 dB and -16.5 dBm in the maximum gain state, respectively. The chip consumes 30.8 mW from 1.1 V voltage supply and the core area is 370 um × 930 um.
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