表面等离子共振
材料科学
表面等离子体子
等离子体子
局域表面等离子体子
核磁共振
光学
光电子学
纳米技术
物理
纳米颗粒
作者
Hiroyuki Kashiwagi,Ikuo Yoneda,Keiko Morishita,Ryoji Yoshikawa,Takashi Hirano,Tetsuro Nakasugi
标识
DOI:10.7567/jjap.51.06fb12
摘要
Inspection using surface plasmon resonance is demonstrated by using a Cr photomask with a 200 nm line and space pattern. This inspection makes it possible to detect Cr defects with a side length of 200 nm connected between lines and hole defects disconnected lines. Our experiments indicate that the smallest size of a detectable defect is estimated to be 6.3 nm and the inspection time is less than 10 min by assuming a multibeam system. Moreover, we can apply surface plasmon resonance to the detection of critical dimension error within 10 nm on the photomask. In conclusion, the resolution and throughput for our inspection technique using surface plasmon resonance are higher than those of a conventional mask inspection technique.
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