Investigation of Optical and Electrochromic Properties of Tungsten Oxide Deposited with Horizontal DC and DC Pulse Magnetron Sputtering

The proposal of this research was to compare the optical and electrochromic properties of tungsten oxide (WO 3 ) thin films deposited with a horizontal direct current (DC) and DC pulse magnetron sputtering. These WO 3 thin films were deposited onto indium tin oxide (ITO) glass and p-type silicon substrate at different gas ratios of oxygen and argon. The variation in the transmittance between the coloring and bleaching was important for the smart window. WO 3 thin films have good electrochromic properties at gas ratios of oxygen/argon (O 2 /Ar) of 0.7 and 0.6 for DC and DC pulse magnetron sputtering, respectively. However, WO 3 thin films deposited by DC pulse magnetron sputtering have better optical and electrochromic properties than the films deposited by DC magnetron sputtering.