覆盖层
X射线光电子能谱
科罗尼
材料科学
紫外光电子能谱
带材弯曲
薄膜
高定向热解石墨
光电发射光谱学
工作职能
结合能
分析化学(期刊)
费米能级
光谱学
热解炭
光电子学
化学
原子物理学
纳米技术
分子
物理化学
扫描隧道显微镜
核磁共振
电子
量子力学
物理
有机化学
色谱法
热解
图层(电子)
作者
Paul G. Schroeder,C. B. France,B. A. Parkinson,R. Schlaf
摘要
The energy level alignment at the interfaces between para-sexiphenyl/highly oriented pyrolytic graphite (HOPG), coronene/SnS2, and coronene/HOPG were determined using in situ thin film deposition in combination with x-ray photoelectron spectroscopy (XPS) and ultraviolet photoemission spectroscopy (UPS) measurements. The organic thin films were grown in multiple steps by vapor deposition, then sequentially characterized in situ after each growth step. The vacuum cleaved single crystals of SnS2 and HOPG substrates provided clean, atomically flat, and chemically inert surfaces, allowing for the investigation of the phenomena of band bending and interface dipoles without the interference of chemical reactions or morphological problems. Due to the distinctly different work functions of the HOPG (Φ=4.65 eV) and SnS2 (Φ=5.45 eV) substrates, the observed shifts in the binding energies of the organic overlayer related XPS core level emission lines could be associated with band bending resulting from Fermi level equilibration between the organic thin films and substrates. Possible occurrence of screening effects due to the different polarization energies of the two substrates can, however, complicate the ability to precisely measure band bending. Low intensity XPS work function measurements enabled the detection of the overlayer-thickness-dependent onset of charging phenomena in the UPS measurements. This allowed the precise determination of the highest occupied molecular orbital alignment of the organic molecules at the investigated interfaces.
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