Atomic Layer Deposition: Atomic Layer Deposition on Dispersed Materials in Liquid Phase by Stoichiometrically Limited Injections (Adv. Mater. 52/2019)

In article number 1904276, Jeremy S. Luterbacher and co-workers present an easily scalable method for atomic layer deposition on high-surface-area materials and nanoparticles. Oxides, sulfides, and phosphates are deposited in the liquid phase without using any excess reactant, while the gas-phase coating quality is preserved.