Defect Localization on MIM Capacitor Array by Circuit Edit using Focused-Ion Beam (FIB)

Metal-Insulator-Metal (MIM) capacitor arrays are commonly found in mixed-signal power electronic integrated circuits. Defect localization to a single MIM capacitor plate in the array often involves topside micro- probing fault isolation and Passive Voltage Contrast (PVC) analysis. These methods can be destructive, involve significant sample preparation time and challenging without a proper topside fault isolation tool. In this paper, a different method will be presented for isolating a single MIM capacitor plate from the array through circuit editing using Focused-Ion Beam (FIB).