物理
高功率脉冲磁控溅射
作文(语言)
纳米技术
溅射沉积
薄膜
溅射
材料科学
量子力学
语言学
哲学
作者
Ph. V. Kiryukhantsev–Korneev,Р. А. Вахрушев,А. Д. Сытченко,A. Yu. Potanin,S. I. Rupasov,Н. В. Швындина,Е. А. Левашов
标识
DOI:10.1134/s1063778823090120
摘要
This work is devoted to the production of a ceramic target (ZrSi2–ZrB2–MoSi2)/Cr by hot pressing of products of self-propagating high-temperature synthesis and deposition of coatings in the Zr–Si–Mo–B system by DC magnetron sputtering and high-power pulsed magnetron sputtering. The composition and structure of the initial powder mixtures, SHS products, a two-layer functionally graded target, and coatings deposited during its sputtering have been studied. It is shown that the developed target (ZrSi2–ZrB2–MoSi2)/Cr can be successfully used to obtain coatings with a dense homogeneous defect-free structure, including at high-energy sputtering regimes, peak current of 50 A, and peak power of 50 kW.
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