Photoplastic anisotropy in nanoindentation of wurtzite ZnO single crystals

纤锌矿晶体结构 纳米压痕 材料科学 各向异性 宽禁带半导体 凝聚态物理 复合材料 结晶学 纳米技术 冶金 光电子学 化学 光学 物理
作者
Hiroto Oguri,Yan Li,Xufei Fang,Atsutomo Nakamura
出处
期刊:Applied Physics Letters [American Institute of Physics]
卷期号:126 (11) 被引量:2
标识
DOI:10.1063/5.0248543
摘要

Anisotropy plays a crucial role in understanding and optimizing the properties of materials with directional dependencies. The hexagonal wurtzite structure, which is a typical crystal structure in compound semiconductors, demonstrates pronounced anisotropy, especially in its response to external stimuli. Recently, mechanical behavior under light illumination has attracted increasing interest especially in semiconductor compounds. In this study, we investigated the anisotropy of illumination effects on the nanomechanical properties of wurtzite ZnO. Four surface orientations—(0001), (0001) 45° off, (11¯00), and (21¯1¯0)—were subjected to nanoindentation creep and nanoindentation hardness tests under controlled light illumination. The indentation depth during nanoindentation creep under light illumination was consistently smaller than that in darkness for all surface orientations, confirming that light suppresses indentation creep deformation, but to different degrees depending on the surface orientation. This suggests that the activated slip systems and the distribution of dislocations play a crucial role in modulating dislocation behavior under light illumination. The nanoindentation hardness followed the trend on the four surface orientations: (0001) > (0001) 45° off > (11¯00) > (21¯1¯0), reflecting anisotropic behavior in nanomechanical properties. Second and subsequent pop-in events were extracted, exhibiting different behaviors depending on the surface orientations, and may play a key role in determining the anisotropy in nanoindentation hardness. Our findings contribute to a comprehensive understanding of the plastic anisotropy under light control in wurtzite ZnO.

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