Designing X-ray-Excited UVC Persistent Luminescent Material via Band Gap Engineering and Its Application to Anti-Counterfeiting and Information Encryption

发光 加密 材料科学 激发 紫外线 光电子学 激发态 带隙 纳米技术 计算机科学 原子物理学 物理 计算机安全 量子力学
作者
Lin Liu,Shanshan Peng,Yuxuan Guo,Lin Ye,Xia Sun,Liang Song,Junpeng Shi,Yun Zhang
出处
期刊:ACS Applied Materials & Interfaces [American Chemical Society]
卷期号:14 (36): 41215-41224 被引量:27
标识
DOI:10.1021/acsami.2c12407
摘要

Persistent luminescent materials (PLMs) are promising candidates for the anti-counterfeiting and information encryption field. However, ultraviolet (UV) excitation and visible emission are partially responsible for enabling information that has been encrypted to combat counterfeiting to be accessed by trial and error, resulting in imitation and information leakage. Here, we propose the possibility of controlling the persistent luminescent (PersL) emission spectra and its excitation light source with the use of band gap engineering, while obtaining X-ray exciting, not UV exciting UV PLM for advanced anti-counterfeiting and encryption application. Cationic substitution was used to adjust the width of the band gap of Lu(X)O4 (X = V, Nb, Ta, and P) from ∼4 to 9 eV. In addition, Bi3+ was introduced into the host as an emitter, which enabled the PersL emission spectra to be modulated from ∼550 to 230 nm. Among these PLMs, LuPO4:Bi3+ has unique optical properties. Under UV excitation, LuPO4:Bi3+ exhibits weak, inconspicuous visible down-conversion luminescence (DCL), without PersL ceasing once excitation is discontinued. Interestingly, LuPO4:Bi3+ displays UV PersL after X-ray excitation, and human eyes are insensitive to UV PersL, which requires specialized optical equipment to detect. A proof-of-concept assessment of LuPO4:Bi3+ for anti-counterfeiting and information encryption applications demonstrated its suitability in this regard.
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