Refractive micolens arrays for photolithography

We report on the fabrication of high-quality microlens arrays (refractive, plano-convex) on 8″-fused silica wafers. The lens arrays are used for Microlens Projection Lithography and within UV-light illumination systems. Microlens Projection Lithography is an innovative technique using KARL SUSS Mask Aligners equipped with an ultra-flat microlens-based array-imaging system. Microlens Projection Lithography provides an increased depth of focus (> 50 um) at a larger working distance (> 1 mm) than standard proximity printing. Microlens Projection Lithography allows photolithography on curved or non-planar substrates, in V-grooves, holes, etc. using a KARL SUSS Mask Aligner.