Polyhydroxy organic molecule-cross-linked polyvinylidene fluoride with enhanced breakdown strength and energy density

聚偏氟乙烯 材料科学 电介质 介电强度 储能 聚合物 复合材料 氢气储存 工作(物理) 氟化物 能量密度 化学工程 氟 机械强度 氢 光电子学 氟化氢 介电损耗
作者
Hao Ren,Xiaoyi Zhang,Shuxuan Li,Zhonglin Wang,Zhi Li,Juntao Zhou,Xin qiao Zhang,Xin Zhang
出处
期刊:Applied Physics Letters [American Institute of Physics]
卷期号:128 (15) 被引量:2
标识
DOI:10.1063/5.0320313
摘要

Polyvinylidene fluoride (PVDF) has been extensively studied for dielectric energy storage applications owing to its excellent dielectric properties. There remains a persistent demand to enhance its breakdown strength and achieve higher energy storage density. In this work, a hydrogen-bonding cross-linking strategy is demonstrated to effectively enhance the breakdown strength and energy storage performance of PVDF. Tris(hydroxymethyl)nitromethane (THNM), containing multiple hydroxyl groups, was employed as a cross-linking agent to form multiple hydrogen bonds with the C–F groups in PVDF chains via a facile solution-casting process. The establishment of a hydrogen-bonding cross-linked network significantly enhances the mechanical strength and introduces charge traps into the PVDF matrix, thereby increasing the breakdown strength from 572 MV/m for the pristine PVDF film to 744 MV/m for the THNM-cross-linked-PVDF film (T-c-PVDF). Consequently, the T-c-PVDF film achieves a high energy storage density of 21.83 J/cm3, representing a 150% improvement over the pure PVDF film, while maintaining a charge–discharge efficiency exceeding 70%, and the energy storage performance stands out among PVDF-based dielectric materials from state-of-the-art works. This work highlights the significant potential of constructing a hydrogen-bonding cross-linked network within dielectric polymers in enhancing their breakdown strength and energy storage performance.
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