材料科学
光电子学
激光器
半导体激光器理论
光学
光纤激光器
光纤
激光束
可调谐激光器
分布反馈激光器
折射率
电子束光刻
光通信
光放大器
注射播种机
分束器
相位调制
集成光学
作者
Anyao Zhu,Kun Zhan,Zhengqing Ding,Chaoyuan Yang,Jie Liang,Jianjun Zhang,Ying Yu,Siyuan Yu
摘要
The rapid expansion of large-scale artificial intelligence data centers and the growing demand for high-performance radio-over-fiber (RoF) systems necessitate high-efficiency, ultra-low noise, highly linear, and thermally stable lasers. Here we demonstrate a high-performance O-band InAs/GaAs quantum-dot (QD) distributed-feedback (DFB) laser architecture incorporating a laterally coupled, shallow-etched sidewall grating within a trapezoidal ridge waveguide. At room temperature, the fabricated devices achieve a single-facet output power of 70 mW with an impressive slope efficiency of 0.372 W·A −1 , while maintaining excellent single-mode emission with a side-mode suppression ratio (SMSR) up to 61 dB. For optical interconnect applications, these lasers exhibit exceptional thermal stability, sustaining stable single-mode operation at 125°C with an output power exceeding 6 mW. Furthermore, they show robust tolerance to optical feedback, with the SMSR remaining over 50 dB even at a returned power level of −15 dB , enabling isolator-free integration. For RoF applications, the devices achieve an ultra-low relative intensity noise (RIN) of <−170 dB / Hz over the 4–22 GHz frequency range and demonstrate high linearity, with an input 1 dB compression point ( IP 1 dB ) of approximately 25 dBm and a third-order intercept point ( IIP 3 ) of approximately 34.4 dBm. The demonstrated architecture represents a significant advance, as it simultaneously optimizes multiple critical performance metrics—efficiency, thermal stability, feedback resilience, low-noise performance, and large-signal linearity—within a single device. The simple, regrowth-free fabrication process is compatible with heterogeneous integration platforms, making it a highly promising solution for future wafer-scale manufacturing of QD lasers on silicon or thin-film lithium niobate (TFLN) wafers.
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