材料科学
断裂韧性
纳米压痕
各向异性
复合材料
碳化硅
断裂力学
断裂(地质)
韧性
成核
缩进
薄脆饼
偏转(物理)
退火(玻璃)
残余应力
扫描电子显微镜
劈理(地质)
碳化物
作者
Zhiqiang Fan,Jiaxin Zhang,Shengqiang Chen,P. L. Zhang,Yuezhong Feng
标识
DOI:10.1088/1361-6463/ae5984
摘要
Abstract The manufacturability of silicon carbide (SiC) wafers is fundamentally constrained by how cracks nucleate and evolve within a crystallographically anisotropic lattice. In this study, orientation-controlled nanoindentation was used to investigate the fracture toughness anisotropy of single-crystal 4H-SiC along the <1 1 ¯ 00> and <11 2 ¯ 0> directions on both Si- and C-terminated basal surfaces. The measured fracture toughness ranges from 3.15 to 3.64 MPa m½ and exhibits clear dependence on crystallographic orientation and surface polarity. Crack propagation along <1 1 ¯ 00> shows lower resistance and predominantly linear cleavage, whereas the <11 2 ¯ 0> direction promotes crack deflection and branching. The Si-terminated surface consistently shows slightly higher fracture resistance than the C face. These results demonstrate that intrinsic fracture anisotropy governs crack evolution in 4H-SiC and provides a quantitative basis for optimizing scanning direction and energy input in laser slicing processes.
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