Sulfonic Acid Promoted N -Boc-, N -Cbz-, and N -PMB Cleavage in 1,1,1,3,3,3-Hexafluoro-2-Propanol (HFIP) and Application to Acid Sensitive Substrates

化学 磺酸 劈理(地质) 立体化学 催化作用 高分子化学 产量(工程) 有机化学 组分(热力学) 药物化学 键裂 残留物(化学)
作者
Eddie X. Yang,Amanda Pecora,Ethan L. Fisher,Christopher W. am Ende,John M. Humphrey
出处
期刊:Journal of Organic Chemistry [American Chemical Society]
卷期号:91 (21): 7126-7133
标识
DOI:10.1021/acs.joc.5c02406
摘要

We report on the mild, sulfonic acid promoted removal of N -Boc, N -Cbz, and N -PMB protecting groups in 1,1,1,3,3,3-hexafluoro-2-propanol (hexafluoroisopropanol; HFIP). According to this method, the typical N -Boc group is removed within 5 min upon treatment with 1.0–1.1 mol equiv of a sulfonic acid, such as methanesulfonic acid in neat HFIP, or within 30 min when HFIP is used as a 10% additive in toluene or dichloromethane. The N -Cbz group is efficiently cleaved with 1.1 mol equiv of methanesulfonic acid in neat HFIP at a slower rate, with near-quantitative removal from typical substrates generally realized within 24 h at room temperature or in shorter durations with mild heating. When conducted accordingly, the acid is essentially consumed by the end of the reaction to afford a near-neutral pH solution. The N -PMB group is cleaved in high yield on treatment with ∼2 mol equiv of methanesulfonic acid in HFIP within a couple of hours at room temperature. The relative reaction rates for these processes allow for selective N -Boc cleavage over N -Cbz groups, affording the chemist orthogonal protection options despite each group being removable under similar acidic conditions.
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