化学
磺酸
劈理(地质)
立体化学
催化作用
高分子化学
产量(工程)
有机化学
组分(热力学)
药物化学
键裂
残留物(化学)
作者
Eddie X. Yang,Amanda Pecora,Ethan L. Fisher,Christopher W. am Ende,John M. Humphrey
标识
DOI:10.1021/acs.joc.5c02406
摘要
We report on the mild, sulfonic acid promoted removal of N -Boc, N -Cbz, and N -PMB protecting groups in 1,1,1,3,3,3-hexafluoro-2-propanol (hexafluoroisopropanol; HFIP). According to this method, the typical N -Boc group is removed within 5 min upon treatment with 1.0–1.1 mol equiv of a sulfonic acid, such as methanesulfonic acid in neat HFIP, or within 30 min when HFIP is used as a 10% additive in toluene or dichloromethane. The N -Cbz group is efficiently cleaved with 1.1 mol equiv of methanesulfonic acid in neat HFIP at a slower rate, with near-quantitative removal from typical substrates generally realized within 24 h at room temperature or in shorter durations with mild heating. When conducted accordingly, the acid is essentially consumed by the end of the reaction to afford a near-neutral pH solution. The N -PMB group is cleaved in high yield on treatment with ∼2 mol equiv of methanesulfonic acid in HFIP within a couple of hours at room temperature. The relative reaction rates for these processes allow for selective N -Boc cleavage over N -Cbz groups, affording the chemist orthogonal protection options despite each group being removable under similar acidic conditions.
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