An Investigation on the Chemical Effect in Chemo-Mechanical Polishing

This paper develops a statistical model to analyze the chemical effect on the material removal rate (MRR) in chemo-mechanical polishing of material surfaces (MS). It was considered that the chemical effect comes into play through a passivated layer on the MS. It was found that the effect of such layer on MRR depends on the mean particle radius, the elastic modulus of the pad, and the hardnesses of the passivated layer and the workpiece material.