Effect of V‐Pits Coverage Optoelectronic Characteristics in Green GaN‐Based Mini‐Light‐Emitting Diodes Grown by MOCVD

金属有机气相外延 光电子学 发光二极管 材料科学 二极管 氮化镓 外延 纳米技术 图层(电子)
作者
Shenglong Wei,Xiuheng Zhou,Xiaofeng Chen,Rongkun Chen,Feifan Ma,Yihong Chen,Vedaste Uwihoreye,F. Palacio,Yongxing Liu,Likai Xun,Haihui Xin,Kaiyi Wu,Xitian Liu,Yongzhou Zhao,Kelvin H. L. Zhang
标识
DOI:10.1002/elt2.70014
摘要

ABSTRACT V‐pits have been intensively studied for their role in light‐emitting diodes (LEDs). The coverage of V‐pits in InGaN/GaN multi‐quantum wells (MQWs) is critical for suppressing leakage path through electron blocking layer (EBL). In this study, we have investigated the coverage of V‐pits in green mini‐LEDs modulated via growth parameters optimization and systematically analyzed the characteristics of the photoelectric properties associated with V‐pits coverage on device. Elevated temperatures and pressures result in enhanced adatoms migration, which can achieve a coverage up to 98.8% of V‐pits, improving the crystal quality due to stable surface. Electrical characterization reveals that although high‐coverage devices exhibit suppressed leakage current, their peak external quantum efficiency (EQE) decreases, more seriously spectral blue shift and operating voltage increase due to compromised hole transport uniformity. Intriguingly, intermediate‐coverage samples demonstrate superior breakdown voltage characteristics. Current–voltage curve analysis shows the ideality factor increases from 1.8 to 2.5 with improved coverage, indicating aggravated Shockley–Read–Hall (SRH) recombination with covered V‐pits.

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