材料科学
高功率脉冲磁控溅射
制作
溅射沉积
氮化物
脉冲(物理)
溅射
腔磁控管
物理气相沉积
光电子学
复合材料
冶金
纳米技术
涂层
薄膜
医学
物理
量子力学
病理
替代医学
图层(电子)
作者
Xiaolong Lu,Yan Lu,Xiao Zhang,Zhen Yan,Junying Hao,Wei‐Min Liu
标识
DOI:10.1002/adem.202501226
摘要
This study presents a novel investigation into the deposition of (CrAlVTiNb)N x coatings using the high power impulse magnetron sputtering technique, specifically examining how variations in peak current affect the coatings’ microstructure, deposition rate, and mechanical and tribological properties. The motivation for this research stems from the need to address the limitations of low deposition rates typically associated with the technology, aiming to optimize coating performance for advanced applications in demanding environments. A significant finding of this investigation is that increasing the peak current induces a morphological transition in the coatings from a loose columnar structure to a denser configuration, predominantly characterized by a face‐centered cubic lattice. Furthermore, higher peak currents are positively correlated with improved deposition rates, which is essential for practical applications. Notably, both the S2 and S4 coatings achieve hardness of around 30 GPa. Among the coatings studied, the S2 coating exhibits the highest adhesion strength, with a L C3 value of ≈54.5 N. In contrast, the S1 coating is distinguished by its lowest average friction coefficient of 0.26 and wear rate of 8.43 × 10 −7 mm 3 (Nm).
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