Advances in YIG thin films: Deposition strategies and substrate effects

Yttrium Iron Garnet (YIG) thin films are key materials for advanced microwave, spintronic, and optoelectronic devices due to their ultra-low ferromagnetic losses, high electrical resistivity, and broad functional bandwidth. However, achieving high-quality YIG films with optimized microstructure and minimal defects remains a significant challenge. This review provides a comprehensive examination of recent advancements in deposition techniques, comparing precise physical methods such as pulsed laser deposition (PLD), laser thermal layer growth (LHPG), sputtering, and aerosol-assisted deposition with scalable chemical approaches like liquid-phase epitaxy (LPE), spin coating, dip coating, chemical vapor deposition (CVD), hydrothermal synthesis, spray pyrolysis, and polymer assisted deposition (PAD). Additionally, the impact of substrate selection, ranging from gadolinium gallium garnet (GGG), quartz, alumina (Al2O3), to yttrium aluminum garnet (YAG), on lattice strain, defect formation, and magnetic performance is analyzed. By addressing the interplay between deposition processes, substrate selection, and functional performance, this review offers insights into optimizing YIG thin films for next-generation technological applications.