波分复用
材料科学
通道间距
光电子学
插入损耗
多模光纤
干涉测量
多路复用
光学
频道(广播)
波长
电子工程
光纤
计算机科学
物理
工程类
电信
作者
Yiqiang Chen,Wenyu Liao,Linghua Wang
摘要
Silicon nitride (SiN) is an ideal material which is compatible with complementary metal-oxide-semiconductor (CMOS) technology. Its advantages include suitability for a large spectral range, low propagation loss and low thermo-optic coefficient, etc. Wavelength division (de)multiplexing (WDM) device is a crucial component for optical transmission networks. In this paper, we demonstrate a six-channel WDM device built with angled multimode interferometer (AMMI) structure in SiN material. Using the first- and second-order self-imaging effects in the multimode waveguides, the number of the multiplexed channels is increased from 3 to 6, without increasing the overall length of the device. The device is designed to operate in the C+L band, and the central wavelength spacing between the neighboring channels is 20nm. The simulation results show that the insertion loss of the device in each channel is less than 0.81dB and the averaged crosstalk of the channels is ~14.9dB. Meanwhile, the device also exhibits low temperature sensitivity and large fabrication tolerance, which is suitable for mass production in commercial foundries.
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