Lv430
590 积分 2024-04-03 加入
Wafer level response to mask deficiencies in 0.55-numerical aperture extreme ultraviolet photolithography
4天前
已完结
Computational lithography solutions to support EUV high-NA patterning
4天前
已完结
Source mask optimization (SMO) study for high-NA EUV lithography to achieve single patterning on random logic metal
4天前
已完结
Pupil, mask, wavefront co-optimization for enhanced EUV patterning: reducing LWR and evaluating overlay
4天前
已完结
Multi-dimensional parameters reconstruction of an EUV mask phase defect
13天前
已完结
Fast EUV mask optimization via error-guided stochastic search
22天前
已完结
Mask3D-compatible full-vectorial Hopkins imaging for lithographic modeling
24天前
已关闭
Fast Pixelated Lithographic Source and Mask Joint Optimization Based on Compressive Sensing
1个月前
已完结
Informational Lithography Approach Based on Source and Mask Optimization
1个月前
已完结
Parametric curvilinear OPC using B-splines data format
2个月前
已完结
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