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26 积分 2024-04-03 加入
Machine learning enhanced optical proximity correction modeling for high-NA EUV lithography
12天前
已关闭
EUV full-chip curvilinear mask options for logic via and metal patterning
12天前
已完结
Computing method for extreme ultraviolet lithography imaging with aberration consideration
1个月前
已完结
Impact of partial coherence on the apparent optical transfer function derived from the response to amplitude edges
1个月前
已关闭
Selective Dissolution Resistance Control of EUV Photoresist Using Multiscale Simulation: Rational Design of Hybrid System
1个月前
已完结
Multiscale approach for modeling EUV patterning of chemically amplified resist
1个月前
已完结
Understanding the onset of EUV resist chemical stochastics
1个月前
已完结
Study on Next-Generation EUV Lithography Technology: Hyper NA, the Highest Potential for Practical Implementation
1个月前
已完结
Fast and high-fidelity curvilinear optical proximity correction using boundary iterative optimization
4个月前
已关闭
Fast and high-fidelity curvilinear optical proximity correction using boundary iterative optimization
5个月前
已关闭
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