Lv11
36 积分 2024-04-03 加入
Multiscale approach for modeling EUV patterning of chemically amplified resist
5小时前
待确认
Understanding the onset of EUV resist chemical stochastics
6小时前
已完结
Study on Next-Generation EUV Lithography Technology: Hyper NA, the Highest Potential for Practical Implementation
6小时前
已完结
Fast and high-fidelity curvilinear optical proximity correction using boundary iterative optimization
2个月前
已关闭
Fast and high-fidelity curvilinear optical proximity correction using boundary iterative optimization
3个月前
已关闭
Fundamental characterization of mask with variable Ta thickness
3个月前
已完结
Fast rigorous mask model for extreme ultraviolet lithography
3个月前
已完结
Fast optical proximity correction method adopting An Iterative Threshold Algorithm of Log-Sum Regularization compressive sensing
4个月前
已完结
Optical proximity correction by using unsupervised learning and the patch loss function
4个月前
已关闭
Method for optical proximity correction based on a vector imaging model
4个月前
已完结
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