材料科学
原位
衍射
拉伸试验
极限抗拉强度
复合材料
透射电子显微镜
冶金
光学
纳米技术
物理
气象学
作者
Tijmen Vermeij,Amit Sharma,Doug Steinbach,Jun Lou,Johann Michler,Xavier Maeder
标识
DOI:10.1016/j.scriptamat.2025.116608
摘要
We present a methodology for in situ Transmission Kikuchi Diffraction (TKD) tensile testing that enables nanoscale characterization of the evolution of complex plasticity mechanisms. By integrating a modified in situ scanning electron microscope nanoindenter with a microscale push-to-pull device and a conventional Electron Backscatter Diffraction (EBSD) detector, we achieved TKD measurements at high spatial resolution during mechanical deformation. A dedicated focused ion beam procedure was developed for site-specific specimen fabrication, including lift-out, thinning, and shaping into a dog-bone geometry. The methodology was demonstrated on two case studies: (i) a metastable β-Ti single crystal, on which we quantified the initiation and evolution of nanoscale twinning and stress-induced martensitic transformation, and (ii) a CuAl/Al₂O₃ nanolaminate, which showed nanoscale plasticity and twinning/detwinning in a complex microstructure. Overall, this approach provides a robust alternative to in situ EBSD and transmission electron microscopy testing, facilitating detailed analysis of deformation mechanisms at the nanoscale.
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