Synthesis and evaluation of methyl methacrylate copolymers and terpolymers as electron‐beam resists. I. Poly(methyl methacrylate–methacrylic acid–methacryloyl chloride)

Abstract Terpolymers of methyl methacrylate with methacrylic acid and methacryloyl chloride [poly(MMA‐MAA‐MAC)] were synthesized with high yields by slow radical polymerization. The influence of the temperature of prebaking on the changes in the chemical composition and the molecular weight characteristics of poly(MMA‐5%MAA‐5%MAC) was studied by infrared spectroscopy and gel permeation chromatography. It was found that resists containing terpolymer with molecular weight (M̄ w ) of 41,000, which were prebaked at 100°C, were able to produce high contrast images (γ = 3.3) at doses of 16 μC/cm 2 .