MOCVD-Processed Ni Films from Nickelocene. Part I: Growth Rate and Morphology

An experimental investigation of the relation between operating conditions and growth rate and morphology is presented for nickel films processed from nickelocene by MOCVD. It is shown that growth rates up to 1 μm h−1 can be obtained under the investigated conditions. Deposits present a nodular morphology, the nodules being composed of small (∼20 nm) crystallites. Deposition is favored at temperatures between 160 °C and 180 °C, and at pressures higher than 100 torr, with a high hydrogen partial pressure. This parametric window is delimited by the decrease of the dissociative adsorption of hydrogen on the surface and by the increase of the desorption of nickelocene.