材料科学
吸附
光催化
降级(电信)
异质结
肖特基势垒
四环素类抗生素
化学工程
锆
铪
催化作用
肖特基二极管
水溶液
土霉素
生物传感器
金属
纳米技术
金属有机骨架
表征(材料科学)
抗生素
无机化学
作者
Honglin Zhao,Xiaoli Dong,Yulong Xiang,Nan Zheng,Yang Luo,Jiayao Zheng,Yujia Liu
标识
DOI:10.1021/acsami.6c13349
摘要
Photocatalysis is an efficient approach for antibiotic remediation, but rapid carrier recombination remains a key challenge. Here, we construct an oxygen-vacancy rich Cu/DUT-67 Schottky junction photocatalyst for antibiotics degradation. Surface oxygen vacancies provide abundant adsorption sites, while the interfacial built-in electric field drives directional electron migration, suppressing carrier recombination. The optimized Cu/DUT-67-2 achieves tetracycline and oxytetracycline removal efficiencies of 84.05% within 150 min and 83.87% within 120 min, respectively, substantially outperforming pristine Dresden University of Technology-67 (DUT-67). Mechanistic studies show that h+ and ·O2- synergistically dominate the degradation process. Cu/DUT-67-2 also exhibits excellent stability, and gel microspheres containing the catalyst enable continuous antibiotic removal under illumination. Molecular reactivity and high-performance liquid chromatography-mass spectrometry (HPLC-MS) analyses elucidate the reactive sites, degradation intermediates, and degradation pathways of the antibiotics. Toxicological evaluation and bean sprout germination tests confirm effective degradation with significantly reduced ecological toxicity. Meanwhile, the bacteriostatic rates of Cu/DUT-67-2 against E. coli and S. aureus reach 98.82% and 98.68%, respectively. This work integrates defect regulation with interface engineering for synergistic adsorption and catalysis, offering a feasible strategy for antibiotic pollution remediation.
科研通智能强力驱动
Strongly Powered by AbleSci AI