The role of electron induced secondary electron emission from SiO 2 surfaces in capacitively coupled radio frequency plasmas operated at low pressures

Abstract The effects of electron induced secondary electron (SE) emission from SiO 2 electrodes in single-frequency capacitively coupled plasmas (CCPs) are studied by particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations in argon gas at 0.5 Pa for different voltage amplitudes. Unlike conventional simulations, we use a realistic model for the description of electron-surface interactions, which takes into account the elastic reflection and the inelastic backscattering of electrons, as well as the emission of electron induced SEs ( δ -electrons). The emission coefficients corresponding to these elementary processes are determined as a function of the electron energy and angle of incidence, taking the properties of the surface into account. Compared to the results obtained by using a simplified model for the electron-surface interaction, widely used in PIC/MCC simulations of CCPs, which includes only elastic electron reflection at a constant probability of 0.2, strongly different electron power absorption and ionization dynamics are observed. We find that ion induced SEs ( γ -electrons) emitted at one electrode and accelerated to high energies by the local sheath electric field propagate through the plasma almost collisionlessly and impinge on the opposing sheath within a few nanoseconds. Depending on the instantaneous local sheath voltage these energetic electrons are either reflected by the sheath electric field or they hit the electrode surface, where each γ -electron can generate multiple δ -electrons upon impact. These electron induced SEs are accelerated back into the plasma by the momentary sheath electric field and can again generate δ -electrons at the opposite electrode after propagating through the plasma bulk. Overall, a complex dynamics of γ - and δ -electrons is observed including multiple reflections between the boundary sheaths. At high voltages, the electron induced SE emission is found to strongly affect the plasma density and the ionization dynamics and, thus, it represents an important plasma-surface interaction that should be included in PIC/MCC simulations of CCPs under such conditions.