微电子
材料科学
数码产品
纳米技术
镓
工程物理
半导体
氧化镓
宽禁带半导体
氮化镓
半导体器件
功率半导体器件
电气工程
光电子学
工程类
冶金
图层(电子)
电压
作者
Andrew J. Green,James S. Speck,Grace Xing,P. Moens,Fredrik Allerstam,Krister Gumaelius,Thomas Neyer,Andrea Arias-Purdue,Vivek Mehrotra,Akito Kuramata,Kohei Sasaki,Shinya Watanabe,Kimiyoshi Koshi,J. D. Blevins,Oliver Bierwagen,Sriram Krishnamoorthy,Kevin Leedy,Aaron R. Arehart,Adam T. Neal,Shin Mou
出处
期刊:APL Materials
[American Institute of Physics]
日期:2022-02-01
卷期号:10 (2)
被引量:431
摘要
Gallium Oxide has undergone rapid technological maturation over the last decade, pushing it to the forefront of ultra-wide band gap semiconductor technologies. Maximizing the potential for a new semiconductor system requires a concerted effort by the community to address technical barriers which limit performance. Due to the favorable intrinsic material properties of gallium oxide, namely, critical field strength, widely tunable conductivity, mobility, and melt-based bulk growth, the major targeted application space is power electronics where high performance is expected at low cost. This Roadmap presents the current state-of-the-art and future challenges in 15 different topics identified by a large number of people active within the gallium oxide research community. Addressing these challenges will enhance the state-of-the-art device performance and allow us to design efficient, high-power, commercially scalable microelectronic systems using the newest semiconductor platform.
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