X射线吸收光谱法
材料科学
氧烷
退火(玻璃)
磁化
吸收光谱法
铁磁性
非阻塞I/O
Atom(片上系统)
分析化学(期刊)
X射线光电子能谱
密度泛函理论
光谱学
化学物理
凝聚态物理
化学
核磁共振
计算化学
物理
催化作用
复合材料
嵌入式系统
磁场
计算机科学
量子力学
色谱法
生物化学
作者
Bidyadhar Das,Madhusmita Sahoo,Abhilash Patra,Ashok K. Yadav,S. N. Jha,Prasanjit Samal,Kartik Senapati,Pratap K. Sahoo
摘要
The thin films of Ni and Bi are known to form NiBi3 and NiBi compounds spontaneously at the interface, which become superconducting below 4.2 K and show ferromagnetism either intrinsically or due to Ni impurities. Formation of NiBi3 and NiBi is a slow diffusion reaction, which means the local environment around Ni and Bi atoms may vary with time and temperature. In this report, we assess the feasibility of using X-ray Absorption Spectroscopy (XAS) as a tool to track the changes in local bonding environment in NiBi3 and NiBi. Thermal annealing at temperatures up to 500 °C was used to induce changes in the local environment in NiBi3 system. Consequent decomposition of NiBi3 into NiO and Bi has been tracked through changes in structural and magnetization behavior, which matched well with the findings of XAS. In addition, the magnetic hysteresis measurements indicated that NiO should be the dominant phase when NiBi3 is annealed at 500 °C. This was corroborated from XAS and was found to be >90%. The shift in K-edge of Ni in annealed samples was attributed to increasing charge state on Ni atom, which was ascertained by Bader charge analysis using Density Functional Theory (DFT). This study correlating macroscopic properties of NiBi3 with local bonding environment of the system indicates that XAS can be a very reliable tool for studying dynamics of diffusion in the NiBi3 system.
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