材料科学
二极管
MOSFET
光电子学
肖特基二极管
肖特基势垒
电压
电气工程
晶体管
工程类
作者
Shiro Hino,Hideyuki Hatta,Koji Sadamatsu,Yuichi Nagahisa,S. Yamamoto,T. Iwamatsu,Yasuki Yamamoto,Masayuki Imaizumi,Shuhei Nakata,Satoshi Yamakawa
出处
期刊:Materials Science Forum
日期:2017-05-15
卷期号:897: 477-482
被引量:66
标识
DOI:10.4028/www.scientific.net/msf.897.477
摘要
External Schottky barrier diodes (SBD) are generally used to suppress the conduction of the body diode of MOSFET. A large external SBD is required for a high voltage module because of its high specific resistance, while the forward voltage of SBD should be kept smaller than the built-in potential of the body diode. Embedding SBD into MOSFET with short cycle length increases maximum source-drain voltage where body diode remains inactive, resulting in high current density of SBD current. We propose a MOSFET structure where an SBD is embedded into each unit cell and an additional doping is applied, which allows high current density in reverse operation without any activation of body diode. The proposed MOSFET was successfully fabricated and much higher reverse current density was demonstrated compared to the external SBD. We can expect to reduce total chip size of high voltage modules using the proposed MOSFET embedding SBD.
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