Review of thin film deposition and techniques

The main aim of this paper is to review different thin film deposition techniques and their significance in photovoltaic applications. Chemical methods for preparing thin films are currently attracting due to their relative affordability, simplicity, and suitability for large-area deposition. Since these are low temperature techniques, they prevent substrate oxidation and corrosion and can be employed with a range of substrates, including insulators, semiconductors, and metals. These are gradual processes that enable crystallites to have improved grain structure and better orientation. All deposition techniques entail building a layer on an existing substrate with a thickness that can range from tens of Å to a millimetre depending on various working circumstances. Film growth may occur through ion-by-ion condensation of the materials on the substrates, depending on the deposition circumstances. Thin film deposition can be influenced by various parameters such as PH, temperature, deposition time etc are also described in the present article. Solar selective coatings, solar control, photoconductors, solid state and photoelectrochemical solar cells, optical imaging, hologram recording, optical mass memories etc. are some of the applications of metal chalcogenide films.