Mechanism of mid-spatial-frequency waviness removal by viscoelastic polishing tool

Nanoscale roughness with ultra-precise form control can be readily achieved using compliant finishing methods such as bonnet polishing. However, their weak point lies in the difficulty of removing mid-spatial-frequency (MSF) waviness in the typical range from 0.1 to 5.0 mm wavelength. To overcome this shortcoming, a bonnet tool filled with viscoelastic fluid is developed and a comprehensive model is established to disclose its distinct removal behavior in the MSF range. The model considers tool viscoelasticity, stress distribution and workpiece topography. Experiments show high consistency with theoretical predictions, and show that MSF waviness can be effectively reduced using the proposed method.