Evaluation Of Lithographic Performance Of X-Ray Stepper XS-1

X-ray Lithography is widely considered to be the most promising technology for the fabrication of next-generation ICs. To evaluate its practicality, a newly designed X-ray stepper (XS-1) has been build and installed at the NTT SR facility.1) This paper reports the results of an evaluation of lithographic performance, including critical dimension (CD) control and overlay accuracy.