A unique photoemission method to measure semiconductor heterojunction band offsets
作者
Q. Zhang,Ranfeng Li,Ru Yan,T. Kosel,Huili Grace Xing,Alan Seabaugh,Kunyuan Xu,Oleg A. Kirillov,David J. Gundlach,Curt A. Richter,N. V. Nguyen
出处
期刊:Applied Physics Letters [American Institute of Physics] 日期:2013-01-03卷期号:102 (1): 012101-012101被引量:14
标识
DOI:10.1063/1.4772979
摘要
We report a unique way to measure the energy band offset of a heterojunction by exploiting the light absorption profile in the heterojunction under visible-ultraviolet internal photoemission. This method was used to determine the band alignment of W/Al2O3/n+InAs/p+Al0.45Ga0.55Sb heterojunctions that are of interest for tunnel field-effect transistors. The barrier heights from the InAs and Al0.45Ga0.55Sb valence band maxima to the Al2O3 conduction band minimum are found to be 3.24 eV± 0.05 eV and 2.79 eV± 0.05 eV, respectively, yielding a 0.4 eV± 0.1 eV offset at the InAs/AlGaSb interface. This approach can readily be applied to characterize a wide range of other semiconductor heterojunctions.