响应度
光电二极管
材料科学
雪崩光电二极管
光电子学
电极
击穿电压
硅
电压
偏压
CMOS芯片
雪崩二极管
光学
电气工程
光电探测器
物理
探测器
工程类
量子力学
作者
Koichi Iiyama,N. SANNOU,Hiromi Takamatsu
标识
DOI:10.1093/ietele/e91-c.11.1820
摘要
A silicon lateral photodiode is fabricated by standard 0.18µm CMOS process, and the optical detection property is characterized. The photodiode has interdigital electrode structure with the electrode width of 0.22µm and the electrode spacing of 0.6µm. At 830nm wavelength, the responsivity is 0.12A/W at low bias voltage, and is increased to 0.6A/W due to avalanche amplification. The bandwidth is also enhanced from 12MHz at low bias voltage to 100MHz at the bias voltage close to the breakdown voltage.
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