材料科学
功率半导体器件
功率MOSFET
光电子学
宽禁带半导体
MOSFET
工程物理
半导体
碳化硅
功率(物理)
半导体器件
外延
电气工程
电子工程
纳米技术
晶体管
工程类
电压
图层(电子)
物理
冶金
量子力学
标识
DOI:10.1109/ispsd.2000.856762
摘要
The progress in SiC crystal growth of bulk and epitaxial layers for power devices is reviewed. Current status in device processes is introduced. Then, the state-of-the-art SiC power devices are described. "On-resistance" in vertical power MOSFETs which determines the power loss is discussed, and recent progress in SiC MOSFET performance is presented by improving channel mobilities.
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