铝
离子液体
材料科学
氯化物
成核
沉积(地质)
氯化铝
无机化学
钨
电流密度
化学工程
冶金
化学
有机化学
催化作用
古生物学
工程类
物理
生物
量子力学
沉积物
作者
Tianyue Jiang,Markus Brym,G. Dubé,Andrzej Lasia,Gessie Brisard
标识
DOI:10.1016/j.surfcoat.2005.10.046
摘要
The electrodeposition and surface morphology of aluminium on tungsten (W) and aluminium (Al) electrodes from 2 : 1 molar ratio AlCl3–[EMIm]Cl ionic liquids were investigated. Analyses of the chronoamperograms indicate that the deposition process of aluminium on W substrates was controlled by instantaneous nucleation with diffusion-controlled growth, while the deposition processes of aluminium on Al electrodes were found to be associated with kinetic limitations. Constant potential deposition experiments showed that the electrodeposits obtained on both W and Al electrodes between − 0.10 and − 0.40 V (vs. Al(III)/Al) are dense, continuous and well adherent. Dense aluminium deposits were also obtained on Al substrates using constant current deposition between 10 and 70 mA/cm2, and the current efficiency was found to be dependent of the current density varying from 85% to 100%.
科研通智能强力驱动
Strongly Powered by AbleSci AI