Computational lithography and computational metrology for nanomanufacturing
作者
Shiyuan Liu
标识
DOI:10.1109/nems.2011.6017547
摘要
Nanomanufacturing refers to the manufacturing of products with feature dimensions at the nanometer scale. This paper presents the fundamental concepts and key issues of computational lithography and computational metrology for nanomanufacturing. We demonstrate their potentials and challenges by providing several examples carried out in our research group. We believe and expect that they will play a significant role in the future nanomanufacturing.