可靠性(半导体)
动力循环
碳化硅
MOSFET
电气工程
材料科学
降级(电信)
栅氧化层
功率MOSFET
计算机科学
电子工程
光电子学
功率(物理)
电压
工程类
晶体管
物理
量子力学
冶金
作者
Shi Pu,Fei Yang,Nathan Zhang,Bhanu Teja Vankayalapati,Bilal Akin
标识
DOI:10.1109/tia.2022.3160982
摘要
This article evaluates silicon carbide (SiC) mosfet' s reliability and ruggedness comprehensively between two widely employed device package types: common source and Kelvin source. Multiple accelerated lifetime tests are conducted to comprehensively investigate SiC mosfet 's reliability at both package and die levels. Specifically, a conventional high electric field test is applied to induce gate oxide degradation, whereas package degradation is investigated by the widely adopted power cycling test. To mimic gate oxide degradation patterns closer to realistic cases, an active channel gate bias test is proposed in this study, and a fair comparison is made regarding the device's degradation pattern in the conventional high electric field test. Throughout accelerated lifetime tests, devices' electrical parameters, consumable lifetime, and end-of-life failure modes are comprehensively evaluated. For ruggedness comparison, a single-shot short-circuit test is conducted on both common-source and Kelvin-source packaged devices with the same die technique and configuration. Other than analytical discussions with experimental waveforms, failure analysis is also conducted to investigate the device's failure mode and root cause. In respect of experimental results in accelerated lifetime tests and short-circuit tests, the existence of the common-source inductance and resistance may mitigate the electrothermal stress applied on the chip with lower gate–source voltage under load current and results in mitigated device instability and longer consumable lifetime.
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