俘获
电介质
栅极电介质
电容
电荷(物理)
物理
材料科学
电气工程
电极
光电子学
晶体管
量子力学
电压
工程类
生态学
生物
作者
Alwin Daus,Christian Vogt,Niko Münzenrieder,Luisa Petti,Stefan Knobelspies,Giuseppe Cantarella,Mathieu Luisier,Giovanni A. Salvatore,Gerhard Tröster
标识
DOI:10.1109/ted.2017.2703914
摘要
In this paper, we present a novel method to reduce the subthreshold swing (SS) of FETs below 60 mV/decade. Through modeling, we directly relate trap charge movement between the gate electrode and the gate dielectric to SS reduction. We experimentally investigate the impact of charge exchange between a Cu gate electrode and a 5-nm-thick amorphous Al 2 O 3 gate dielectric in an InGaZnO 4 thin-film transistor. Positive trap charges are generated inside the gate dielectric while the semiconductor is in accumulation. During the subsequent detrapping, the SS diminishes to a minimum value of 46 mV/decade at room temperature. Furthermore, we relate the charge trapping/detrapping effects to a negative capacitance behavior of the Cu/Al 2 O 3 metal-insulator structure.
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