材料科学
高电子迁移率晶体管
光电子学
异质结
大气温度范围
宽禁带半导体
晶体管
氮化镓
温度测量
电气工程
纳米技术
图层(电子)
电压
物理
量子力学
工程类
气象学
作者
David Maier,M. Alomari,N. Grandjean,Jean-Francois Carlin,M.A. diForte-Poisson,C. Dua,Andrey Chuvilin,David Troadec,Christophe Gaquière,Ute Kaiser,S.L. Delage,E. Kohn
标识
DOI:10.1109/tdmr.2010.2072507
摘要
The high temperature stability of AlGaN/GaN and lattice-matched InAlN/GaN heterostructure FETs has been evaluated by a stepped temperature test routine under large-signal operation. While AlGaN/GaN high-electron mobility transistors (HEMTs) have failed in an operating temperature range of 500°C, InAlN/GaN HEMTs have been operated up to 900°C for 50 h (in vacuum). Failure is thought to be still contact metallization stability related, indicating an extremely robust InAlN/GaN heterostructure configuration.
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