The numerical results on naphthalene removal in biogas are presented and compared with experiment. Plasma-chemical processes in discharge and post discharge stages are considered. The self-consistent approach for modeling of cleaning process on the basis of pulsed corona discharges is demonstrated. It has been revealed that the reaction of naphthalene (C 10 H 8 ) with excited nitrogen molecule (N 2 (A 3 Sigma)) is very important in the cleaning process in nitrogen-containing mixtures. The addition to N 2 of CO, CO 2 , and H 2 results in the deterioration of treatment.