材料科学
粘附
碳化物
金属
密度泛函理论
产量(工程)
陶瓷
金属键合
电子结构
复合材料
计算化学
化学
冶金
作者
Donald J. Siegel,Louis G. Hector,James B. Adams
出处
期刊:Surface Science
[Elsevier]
日期:2002-02-01
卷期号:498 (3): 321-336
被引量:257
标识
DOI:10.1016/s0039-6028(01)01811-8
摘要
We examine the relative stability and adhesion of the polar Al(1 1 1)/WC(0 0 0 1) interface using density functional theory. Relaxed atomic geometries and the ideal work of adhesion were calculated for six different interfacial structures, taking into account both W- and C-terminations of the carbide. The interfacial electronic structure was analyzed to determine the nature of metal/carbide bonding. Based on the surface and interfacial free energies, we find that both the clean WC(0 0 0 1) surface and the optimal interface geometry are W-terminated. Although both terminations yield substantial adhesion energies in the range 4–6 J/m2, bonding at the optimal C-terminated structure is nearly 2 J/m2 stronger, consistent with an argument based on surface reactivity. In addition, we examine the effects of Li and Mg alloying elements at the interface, and find that they result in a strain-induced reduction of metal–ceramic adhesion.
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