Surface and Interface Engineering of Graphene Oxide Films by Controllable Photoreduction

We report herein the engineering of the surface/interface properties of graphene oxide (GO) films by controllable photoreduction treatment. In our recent works, typical photoreduction processes, including femtosecond laser direct writing (FsLDW), laser holographic lithography, and controllable UV irradiation, have been employed to make conductive reduced graphene oxide (RGO) microcircuits, hierarchical RGO micro-nanostructures with both superhydrophobicity and structural color, as well as moisture-responsive GO/RGO bilayer structures. Compared with other reduction protocols, for instance, chemical reduction and thermal annealing, the photoreduction strategy shows distinct advantages, such as mask-free patterning, chemical-free modification, controllable reduction degree, and environmentally friendly processing. These works indicate that the surface and interface engineering of GO through controllable photoreduction of GO holds great promise for the development of various graphene-based microdevices.