抛光
磨料
材料科学
平坦度(宇宙学)
光学
表面粗糙度
表面光洁度
复合材料
光学玻璃
平面
宇宙学
量子力学
物理
作者
Achim J. Leistner,E.G. Thwaite,Frank J. Lesha,Jean M. Bennett
出处
期刊:Applied optics-OT
[Optica Publishing Group]
日期:1992-04-01
卷期号:31 (10): 1472-1472
被引量:35
摘要
Teflon polishing is compared with pitch polishing as a method for achieving supersmooth and flat optical surfaces. Because a Teflon lap wears slowly, it will retain its surface shape to produce extremely flat optical surfaces, lambda/100, consistently and reliably for extended periods of time, of the order of days. To compare the two methods, we polished 50-mm-diameter samples of various optical materials, using colloidal suspensions in water on both pitch and Teflon laps under the same polishing conditions. Flatness was maintained to better than lambda/10, and roughness less than 10 A rms was measured on all samples by two Talystep surface-profiling instruments, one in the United States and one in Australia, with excellent agreement between measurements made by the two instruments. It was possible to obtain flat andsmooth surfaces (<4-A rms roughness) on all materials (except for F4, flint glass), but only certain combinations of material, abrasive, and lap could be used to give the correct polishing conditions and s rface chemistry.
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