材料科学
拉伤
极限抗拉强度
带隙
拉伸应变
工作(物理)
接口(物质)
压缩(物理)
密度泛函理论
凝聚态物理
复合材料
光电子学
化学
热力学
计算化学
物理
内科学
医学
毛细管作用
毛细管数
作者
Caiping Wan,Bo Li,Haiou Zhu,Hongle Xu,Tianchun Ye
标识
DOI:10.1016/j.jcrysgro.2023.127085
摘要
Even though the interface of SiO2/SiC can be improved by performing nitridation processes, it is unclear how interfacial traps are decreased or why this reduces the flat-band voltage. To discover the physical origin of the correlation between the SiO2/SiC interface traps and the oxidation processes, the effects of biaxial strain on the bandgap (Eg) of SiO2/4H-SiC (0001) were studied by first-principles calculations of the Heyd–Scuseria–Ernzerhof (HSE06) mixing function, with results closely corresponding to the experimental Eg of 4H-SiC. The compressive and tensile strains led to a change not only in the Eg, described in previous work but also in the total energy E0 of SiO2/4H-SiC (0001), where the structure reaches equilibrium at 2 % compression. We discussed in more detail that the size of the Eg is mainly affected by the O 2p state in SiO2 and the C 2p and Si 3p state in SiC in our works. These results indicate that the strain method can be used to adjust the Eg of SiO2/4H-SiC, thereby changing its interface state.
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